Gratulujemy zespołowi w składzie: dr hab. inż. Andrzej Sikora, dr inż Krzysztof Gajewski, mgr inż. Dominik Badura, mgr inż. Bartosz Pruchnik, dr hab. inż. Tomasz Piasecki, mgr inż. Kamil Raczkowski oraz prof. dr hab. inż. Teodor Gotszalk opublikowania pracy "Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties" wydanej w czasopiśmie Sensors (IF 3,4).

Conductive Atomic Force Microscopy—Ultralow-Current Measurement Systems for Nanoscale Imaging of a Surface’s Electrical Properties

One of the most advanced and versatile nanoscale diagnostic tools is atomic force microscopy. By enabling advanced imaging techniques, it allows us to determine various assets of a surface, including morphological, electrical, mechanical, magnetic, and thermal properties. Measuring local current flow is one of the very important methods of evaluation for, for instance, photovoltaic materials or semiconductor structures and other nanodevices. Due to contact areas, the current densities can easily reach above 1 kA/m²; therefore, special detection/measurement setups are required. They meet the required measurement range, sensitivity, noise level, and bandwidth at the measurement scale. Also, they prevent the sample from becoming damaged and prevent unwanted tip–sample issues. In this paper, we present three different nanoscale current measurement solutions, supported with test results, proving their performance.

https://doi.org/10.3390/s24175649

Sensors 2024, 24, 5649